Details

Project TitleOrganic Hosts Covalently Bonded to Silicate Matrices for Separations, Catalysis and Remediation
Track Code2001-075
Short Description

New material in a new class of solid organic host silicon matrix polymers to create soluble and heterogeneous systems.

#chemical #catalyst #materials #polymer #environmentremediation

Abstract

Northwestern researchers have created a new material that is a new class of solid organic host silicon (polysilsesquioxane) matrix polymers. A wide range of branched and cross-linked polymer networks with cyclodextrins (CD) and calixarenes (CX) organic hosts can be prepared with this technology. Polymer properties are readily varied by adjusting starting host ring size, silicon reagent and reaction parameters. Soluble and heterogeneous systems can be created at modest materials cost. Inorganic silicates, which provide mesoporous cavities, and organic shape / size template molecules are combined to create a novel family of materials capable of tailored separation, catalytic, and surface active functions including metal ion removal and organic molecule recovery. The polymers offer a stable silicate - organic host matrix that can be readily modified by utilizing different host structures to bind target inorganic and organic species. The materials promise facile and cost effective guest recovery and resin regeneration. Potential applications include process separations, catalysis, chiral reactivity, product recovery and environmental treatment. Sample materials have been produced and characterized.

 
TagsCHEMICAL: catalyst, environment: remediation, MATERIALS: polymer
 
Posted DateMar 7, 2013 4:19 PM

Inventor(s)

Joseph Lambert*
Chunquing Liu

Applications

• Process separations
• Catalysis
• Chiral reactivity
• Product recovery (e.g. organic molecule recovery)
• Environmental treatment (e.g. metal ion removal)

Advantages

• Stable composition
• Ability to be tailored for specific separation, catalytic, and surface active functions
• Readily modifiable
• Facile and cost effective guest recovery and resin regeneration

Publications

IP Status

U.S. Patent No: 7,271,259

Contact Information

Nicole Janovick, JD, PhD

Invention Manager

(t) 847.491.0320

(e) nicole.janovick@northwestern.edu